Multi-terminal inductor for integrated circuit

ABSTRACT

A multi-terminal inductor and method for forming the multi-terminal inductor are provided. In some embodiments, an interconnect structure is arranged over a semiconductor substrate. A passivation layer is arranged over the interconnect structure. A first magnetic layer is arranged over the passivation layer, and a conductive wire laterally extends from a first input/output (I/O) bond structure at a first location to a second I/O bond structure at a second location. A third I/O bond structure branches off of the conductive wire at a third location between the first location and the second location. A connection between the third I/O bond structure and the first I/O bond structure has a first inductance. Alternatively, a connection between the first I/O bond structure and the second I/O bond structure has a second inductance different than the first inductance.

REFERENCE TO RELATED APPLICATIONS

This Application is a Continuation of U.S. application Ser. No.16/587,305, filed on Sep. 30, 2019, which is a Continuation of U.S.application Ser. No. 16/106,525, filed on Aug. 21, 2018 (now U.S. Pat.No. 10,475,877, issued on Nov. 12, 2019). The contents of theabove-referenced Applications are hereby incorporated by reference intheir entirety.

BACKGROUND

An integrated circuit is an assembly of electronic components on asingle piece of semiconductor material. A widely used electroniccomponent in an integrated circuit is an inductor. An inductor is apassive element that stores electrical energy in a magnetic field whenelectric current flows through the inductor. Because any conductor ofelectrical current has inductive properties, inductors vary greatly intheir design. Inductors are versatile devices that may be used in, amongother things, RL filters, LC circuits, RLC circuits, power supplies,transformers, and many other circuit components.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isnoted that, in accordance with the standard practice in the industry,various features are not drawn to scale. In fact, the dimensions of thevarious features may be arbitrarily increased or reduced for clarity ofdiscussion.

FIGS. 1A-1B illustrate various top views of some embodiments of amulti-terminal inductor having a plurality of inductor units connectedby a printed circuit board in various different combinations.

FIGS. 2A-2C illustrate various views of some embodiments of amulti-terminal inductor of the present disclosure.

FIGS. 3A-3C illustrate various views of some more embodiments of themulti-terminal inductor of FIGS. 2A-2C.

FIGS. 4A-4C illustrate various views of some more embodiments of themulti-terminal inductor of FIGS. 2A-2C.

FIGS. 5A-5C and 6A-6C illustrate various views of various moreembodiments of the multi-terminal inductor of FIGS. 2A-2C without afirst magnetic layer or a second magnetic layer.

FIGS. 7A-7E illustrate various views of more embodiments of themulti-terminal inductor of the present disclosure.

FIG. 8 illustrates a simplified top view of some more embodiments of thefirst inductor unit of the multi-terminal inductor of FIGS. 7A-7E.

FIG. 9 illustrates a simplified top view of some more embodiments of thefirst inductor unit of the multi-terminal inductor of FIGS. 7A-7E.

FIGS. 10A-10C illustrate various views of some more embodiments of themulti-terminal inductor of FIGS. 7A-7E without a first magnetic layer.

FIGS. 11-17 illustrate a series of views of some embodiments of a methodfor forming a multi-terminal inductor of the present disclosure.

FIG. 18 illustrates a flowchart of some embodiments of a method forforming the multi-terminal inductor of the present disclosure andselectively setting the inductance of the multi-terminal inductor of thepresent disclosure.

DETAILED DESCRIPTION

The present disclosure will now be described with reference to thedrawings wherein like reference numerals are used to refer to likeelements throughout, and wherein the illustrated structures are notnecessarily drawn to scale. It will be appreciated that this detaileddescription and the corresponding figures do not limit the scope of thepresent disclosure in any way, and that the detailed description andfigures merely provide a few examples to illustrate some ways in whichthe inventive concepts can manifest themselves.

The present disclosure provides many different embodiments, or examples,for implementing different features of this disclosure. Specificexamples of components and arrangements are described below to simplifythe present disclosure. These are, of course, merely examples and arenot intended to be limiting. For example, the formation of a firstfeature over or on a second feature in the description that follows mayinclude embodiments in which the first and second features are formed indirect contact, and may also include embodiments in which additionalfeatures may be formed between the first and second features, such thatthe first and second features may not be in direct contact. In addition,the present disclosure may repeat reference numerals and/or letters inthe various examples. This repetition is for the purpose of simplicityand clarity and does not in itself dictate a relationship between thevarious embodiments and/or configurations discussed.

Further, spatially relative terms, such as “beneath,” “below,” “lower,”“above,” “upper” and the like, may be used herein for ease ofdescription to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the figures. The spatiallyrelative terms are intended to encompass different orientations of thedevice in use or operation in addition to the orientation depicted inthe figures. The apparatus may be otherwise oriented (rotated 90 degreesor at other orientations) and the spatially relative descriptors usedherein may likewise be interpreted accordingly.

Some inductors are integrated monolithically on a semiconductorsubstrate. In some embodiments, integrated inductors are formed withinback-end-of-the-line (BEOL) metal interconnect layers over a substrate.Because any conductor of electrical current has inductive properties,integrated inductors are implemented in a variety of layouts, forexample, spiral inductors, planar spiral inductors, straight lineinductors, or coupled inductors. Moreover, depending on the application,an integrated inductor may comprise, for example, a dielectric material(e.g., an air core), a ferromagnetic, or a ferrimagnetic core. Forexample, an integrated spiral inductor may comprise a magnetic corearranged within a first metal layer. A metal wire may wind around themagnetic core in a helical pattern, such that the metal wire hasmultiple turns that continuously extend around the magnetic core.

One challenge with the above inductors is providing customers with aninductor that precisely fits their needs. Customers often designintegrated circuits (ICs) requiring an inductor. These ICs are designedto run at a specific inductance. Typically, the manufacturer of the ICimplements the inductor into the customer's IC. However, because eachspecific IC application requires a specific inductance to run optimally,manufactures typically implement a pre-designed inductor having aspecific inductance. This pre-designed inductor may have an inductancethat is a fixed value, which may be greater/less than required for thecustomer's IC. This difference in inductance may increase the overallresistance of the customer's IC and cause the customer's IC to run at aless than optimal state. Furthermore, because the inductance of aninductor is directly proportional to an area of the inductor,implementing an inductor into a customer's IC that is greater thanrequired takes up valuable space on the IC. A partial solution to thischallenge is to design IC specific inductors. However, this greatlyincreases the cost of manufacturing the IC. Therefore, an inductor thatincreases the amount of inductance values a customer may choose fromwithout requiring application specific inductor designs would improvethe functionality and cost of manufacturing ICs.

The present disclosure relates to a multi-terminal inductor (and relatedmethod) that is structured so as to provide inductance at fixedincrements, thereby providing customers with increased inductanceoptions when an inductor is required for an IC. In some embodiments, themulti-terminal inductor is disposed over a passivation layer that isdisposed over an interconnect structure. The multi-terminal inductor maycomprise a plurality of inductor units arranged in an array. Eachinductor unit comprises a conductive wire resulting in each inductorunit having a measurable inductance. Furthermore, each inductor unitcomprises at least two input/output (I/O) bond structures. Therefore,the individual I/O bond structures of each inductor unit may be coupledtogether by the end customer (or the manufacturer) in a variety ofcombinations to achieve various inductances. Accordingly, because themulti-terminal inductor provides customers with increased inductanceoptions, the multi-terminal inductor improves the functionality of ICsand reduces the cost to manufacture ICs.

With reference to FIGS. 1A-1B, various top views 100A-100B of someembodiments of a multi-terminal inductor having a plurality of inductorunits connected by a printed circuit board (PCB) in various differentcombinations is provided.

As illustrated by views 100A-100B of FIGS. 1A-1B, a connection structure102 a/102 b, which often takes the form of a printed circuit board(PCB), is arranged over the multi-terminal inductor 104 a/104 b. Themulti-terminal inductor 104 a/104 b is part of an integrated circuit(IC) formed on a semiconductor substrate. The multi-terminal inductor104 a/104 b comprises a plurality of inductor units 106 a/106 b arrangedin an array. For example, FIG. 1A and FIG. 1B each depict amulti-terminal inductor 104 a/104 b having an array of 48 inductor units106 a/106 b, which are arranged in six columns and eight rows. Forclarity, only one inductor unit 106 a/106 b is labeled in each figure.

Each inductor unit 106 a/106 b comprises at least a first input/output(I/O) bond structure 108 and a second I/O bond structure 110. Eachinductor unit 106 a/106 b comprises a conductive wire 116 which hasinductive properties and which couples a first I/O bond structure 108 toa second I/O bond structure 110. Thus, each inductor unit 106 a/106 bhas a measurable inductance value, for example, 1 nanohenry (nH) to 100nH. In some embodiments, each inductor unit 106 a/106 b within themulti-terminal inductor 104 a/104 b has substantially identicalinductance values. In other embodiments, the inductor units 106 a/106 bmay have differing inductance values, or a combination of substantiallyidentical and differing inductance values. In some embodiments, eachinductor unit 106 a/106 b can also include additional I/O bondstructures 112/114.

The PCB 102 a/102 b comprises a plurality of conductive traces 118 thatconnect to the multi-terminal inductor 104 a/104 b via I/O bondstructures 108/110/112/114 of the inductor units 106 a/106 b. The I/Obond structures may also be referred to as “terminals” in someembodiments. In some embodiments, the I/O bond structures108/110/112/114 are solder bumps that are bonded to a pad (not shown) onthe PCB 102 a/102 b via a heat induced (e.g., reflow oven or infraredheater) solder flow process. The PCB 102 a/102 b is separate from themulti-terminal inductor 104 a/104 b, such that the conductive traces 118of the PCB 102 a/102 b provide a connection external to the IC. In someembodiments, the conductive traces 118 connect the multi-terminalinductor 104 a/104 b to external devices, such as external resistors,external capacitors, and/or external ICs. Thus, after the multi-terminalinductor 104 a/104 b is manufactured, the multi-terminal inductor 104a/104 b can be shipped to a customer, and the customer can then providea PCB 102 a/102 b that has conductive traces 118 configured to connectthe inductor units 106 a/106 b together to achieve a particularinductance desired by the customer.

For example, as illustrated in FIG. 1A, the conductive traces 118 of thePCB 102 a connect the top two rows of inductor units 106 a of themulti-terminal inductor 104 a in series, such that the top two rows ofthe multi-terminal inductor 104 a has a first inductance of twelveinductance values. Furthermore, the same PCB 102 a may connect anotherrow of inductor units 106 a of the same multi-terminal inductor 104 a tooutput a second inductance. For example, as illustrated in the bottomrow of the multi-terminal inductor 104 a, the conductive traces 118 ofthe PCB 102 a connect to a first I/O bond structure 108 of a firstinductor unit 106 a and a second I/O bond structure 110 of the firstinductor unit 106 a, such that the bottom row of the multi-terminalinductor 104 a has a second inductance of one inductance value. Thus,the customer can integrate two (or more) different inductor units 106a/106 b along with other components on the IC and/or external circuitryto achieve a desired functionality.

Further, as illustrated in view 100B of FIG. 1B, each inductor unit 106b may comprise a plurality of I/O bond structures 108/110/112/114. Inthis embodiment, each inductor unit 106 b may output a plurality ofinductance values. For example, an inductor unit 106 b having four I/Obond structures 108/110/112/114 is configured to output at least a firstinductance value, a second inductance value, a third inductance value,and a fourth inductance value. If the inductor unit 106 b is connectedby the conductive traces 118 of the PCB 102 b such that current flowsfrom the first I/O bond structure 108 to the second I/O bond structure110, the inductor will have a first inductance value. If the inductorunit 106 b is connected by the conductive traces 118 of the PCB 102 bsuch that current flows from the third I/O bond structure 112 to thesecond I/O bond structure 110, the inductor will have a secondinductance value that is less than the first inductance value. If theinductor unit 106 b is connected by the conductive traces 118 of the PCB102 b such that current flows from the fourth I/O bond structure 114 tothe second I/O bond structure 110, the inductor will have a thirdinductance value less than the second inductance value. Further, if theinductor unit 106 b is connected by the conductive traces 118 of the PCB102 b such that current flows from the third I/O bond structure 112 tothe fourth I/O bond structure 114, the inductor will have a fourthinductance value that can be the same as or different from each of thefirst, second, and third inductance values.

Moreover, as illustrated in FIG. 1B, part of a row of inductor units 106b may have a first inductance and a second inductance. For example, inthe second row of the multi-terminal inductor 104 b, the second rowoutputs a first inductance due to the conductive traces 118 of the PCB102 b connecting a first inductor unit 106 b to allow current to flowfrom the first I/O bond structure 108 of the first inductor unit 106 bto a second I/O bond structure 112 of the first inductor unit 106 b. Inthe same row, a second inductance is output due to the conductive traces118 of the PCB 102 b connecting a second inductor unit 106 b and a thirdinductor unit 106 b in series, such that current flows from a fourth I/Obond structure 114 of the second inductor unit 106 b through the secondI/O bond structure 110 of the second inductor unit 106 b into the firstI/O bond structure 108 of the third inductor unit 106 b and out thesecond I/O bond structure 110 of the third inductor unit 106 b.

In addition, as illustrated in the bottom two rows of the multi-terminalinductor 104 b of FIG. 1B, inductor units in separate rows may beconnected together. For example, inductor units in the bottommost row ofthe multi-terminal inductor 104 b are connected in series with aninductor unit 106 b in the second to last row of the multi-terminalinductor 104 b. Accordingly, because the inductor units 106 a/106 b ofthe multi-terminal inductor 104 a/104 b may be connected by theconductive traces 118 of the PCB 102 a/102 b in various combinations,the multi-terminal inductor 104 a/104 b provides customers (ormanufacturers) with an inductor having increased inductance optionswithout requiring an application specific inductor design.

Although FIGS. 1A-1B only illustrate a multi-terminal inductor 104 a/104b having an array of 48 inductors units, which are arranged in sixcolumns and eight rows, it will be appreciated that the multi-terminalinductors 104 a/104 b may comprise any number of inductor units 106a/106 b arranged in any number of rows and columns.

With reference to FIGS. 2A-2C, various views 200A-200C of someembodiments of the multi-terminal inductor of the present disclosure areprovided. FIG. 2A illustrates a simplified top view 200A of someembodiments of the multi-terminal inductor of the present disclosure.FIG. 2A is “simplified” because FIG. 2A illustrates only conductivewires 216/218 and a second magnetic layer 236 of each inductor unit204/206. FIG. 2B illustrates a cross-sectional view 200B of someembodiments of the inductor unit of the multi-terminal inductor of FIG.2A, taken along line B-B′ of FIG. 2A. FIG. 2C illustrates across-sectional view 200C of some embodiments of the inductor unit ofthe multi-terminal inductor of FIG. 2A, taken along line C-C′ of FIG.2A.

As illustrated by the views 200A-200C of FIGS. 2A-2C, a multi-terminalinductor 202 comprises a plurality of inductor units 204/206 arranged inan array. For example, the multi-terminal inductor 202 comprises a firstinductor unit 204 and a second inductor unit 206. In some embodiments,the first inductor unit 204 and the second inductor unit 206 arearranged in the same lateral direction. In other embodiments, the firstinductor unit 204 and the second inductor unit 206 are arrangedperpendicular to one another. In some embodiments, the layout of thefirst inductor unit 204 is substantially identical to the layout of thesecond inductor unit 206. In other embodiments, the layout of the firstinductor unit 204 is different than the layout of the second inductorunit 206. As illustrated in FIGS. 1A-1B, a PCB may connect the pluralityof inductor units 204/206 in various combinations to vary the inductanceof the multi-terminal inductor 202. For clarity, only one inductor unit204 is labeled in detail. Because the multi-terminal inductor 202comprises a plurality of inductor units 204/206 that may be connected bya PCB in various combinations, the multi-terminal inductor 202 providesan inductor having increased inductance options without requiring anapplication specific inductor design, which may result in increasedmanufacturing costs or inefficient operating conditions.

The multi-terminal inductor 202 comprises a semiconductor substrate 208.The semiconductor substrate 208 may comprise any type of semiconductorbody (e.g., monocrystalline silicon/CMOS bulk, silicon-germanium (SiGe),silicon on insulator (SOI), etc.). The semiconductor substrate 208 mayalso comprise one or more semiconductor devices (e.g., transistor,resistor, diode, etc.) or portions of semiconductor devices. In someembodiments, the semiconductor device is disposed over/within thesemiconductor substrate 208 in a front-end-of-line (FEOL) process. Forexample, the semiconductor device may be a transistor comprising a gatestack (e.g., a metal gate disposed over a high-k dielectric) disposedover the semiconductor substrate 208 and between a source and drain,while the source and drain are disposed within the semiconductorsubstrate 208.

An interconnect structure 210 is disposed over the semiconductorsubstrate 208. In some embodiments, the interconnect structure 210 isformed in a back-end-of-line (BEOL) process. The interconnect structure210 may comprise a plurality of conductive features, for example,conductive contacts, conductive lines, conductive vias, and/or contactpads formed within an interlayer dielectric (ILD) material. Theconductive features may comprise a metal, such as copper, aluminum,gold, silver, or other suitable metal. The ILD material may comprisesilicon dioxide (SiO₂) or another suitable oxide, such as a low-kdielectric material. In some embodiments, the interconnect structure 210may comprise a plurality of metal layers (e.g., metal layer 1, metallayer 2, etc.) disposed over one another. Each metal layer may comprisea conductive line, and a conductive via may connect a conductive linefrom a first metal layer to a conductive line of a second metal layer.Some conductive vias connect a conductive line to a contact pad disposednear a top surface of the interconnect structure 210.

A passivation layer 212 is disposed over the interconnect structure 210.In some embodiments, the passivation layer is formed in a BEOL process.The passivation layer 212 may conformally line an uppermost surface ofthe interconnect structure 210. In some embodiments, the passivationlayer 212 has a substantially planar top surface. The passivation layer212 may comprise SiO₂, silicon nitride (Si₃N₄), polyimide compounds, orother suitable materials.

In some embodiments, a first magnetic layer 214 is disposed over thepassivation layer 212. The first magnetic layer 214 is formed over thepassivation layer 212 using a suitable process, for example, chemicalvapor deposition (CVD), physical vapor deposition (PVD), atomic layerdeposition (ALD), sputtering, electrochemical plating, electrolessplating, or some other deposition or growth process. The first magneticlayer 214 comprises a magnetic material, such as cadmium zinc telluride(CZT), an iron-nickel (NiFe) compound, or other suitable magneticmaterials. In some embodiments, the first magnetic layer 214 maycomprise a plurality of stacked layers. In other embodiments, the firstmagnetic layer 214 may comprise a bulk magnetic material that extendsfrom a bottom surface of the first magnetic layer 214 to a top surfaceof the first magnetic layer 214.

In some embodiments, the first magnetic layer 214 may comprise arectangular layout. In some embodiments, the first magnetic layer 214may comprise a plurality of discrete portions, such that each inductorunit 204/206 comprises a discrete portion of the first magnetic layer214. In other embodiments, the first magnetic layer 214 may comprisecontinuous portions, such that a portion of the first magnetic layer 214continuously extends under a plurality of inductor units 204/206.Further, the first magnetic layer 214 may have a thickness in a rangefrom about 0.1 micrometers (μm) to about 15 μm. More specifically, thefirst magnetic layer 214 may have a thickness in a range from 0.1 μm to0.5 μm, 0.5 μm to 2.5 μm, 2.5 μm to 4.5 μm, 4.5 μm to 7.5 μm, 7.5 μm to10 μm, 10 μm to 12.5 μm, or 12.5 μm to 15 μm. Moreover, the firstmagnetic layer 214 may have a width in a range from about 10 μm to about500 μm. More specifically, the first magnetic layer 214 may have a widthin a range from 10 μm to 50 jam, 50 μm to 100 μm, 100 μm to 150 μm, 150μm to 200 μm, 200 μm to 250 μm, 250 μm to 300 jam, 300 μm to 350 μm, 350μm to 400 μm, 400 μm to 450 μm, or 450 μm to 500 μm.

A conductive wire 216/218 is disposed over the first magnetic layer 214.In some embodiments, each inductor unit 204/206 comprises a firstconductive wire 216 and a second conductive wire 218 disposed over thefirst magnetic layer 214. The conductive wire 216/218 may, for example,be deposited or grown by CVD, PVD, ALD, sputtering, electrochemicalplating, electroless plating, or some other deposition or growthprocess. The conductive wire 216/218 comprises a conductive material,such as copper (Cu), aluminum (Al), gold (Au), silver (Ag), Al—Cucompounds, or any other suitable conductive material. In someembodiments, the conductive wire 216/218 may be a post-passivationcopper interconnect. In some embodiments, the conductive wire 216/218has a thickness in a range from about 0.5 μm to about 50 μm and/or awidth in a range from about 0.5 μm to about 50 μm. More specifically,the conductive wire 216/218 may have a thickness/width in a range from0.5 μm to 5 μm, 5 μm to 10 μm, 15 μm to 20 μm, 20 μm to 25 μm, 25 μm to30 μm, 30 μm to 40 μm, or 40 μm to 50 μm.

In some embodiments, a barrier layer 222 is disposed over a firstisolation layer 220, such that the barrier layer 222 and the firstisolation layer 220 physically separate and electrically isolate theconductive wire 216/218 from the first magnetic layer 214. In someembodiments, the barrier layer 222 comprises tantalum (Ta), tantalumnitride (TaN), titanium (Ti), titanium nitride (TiN), and/or tungsten(W) among others. A seed layer, from which the conductive wire 216/218is grown, is disposed directly over the barrier layer 222. The seedlayer comprises Cu, Cu alloys, Al, Al alloys, Au, Ag, Al—Cu compounds,or other suitable materials, and may coalesce into the conductive wire216/218 when the conductive wire 216/218 is grown from the seed layer,and as such is not called out explicitly in FIG. 2B. The first isolationlayer 220 comprises a dielectric material, such as SiO₂, Si₃N₄, a low-kdielectric, or some other suitable dielectric material. The firstisolation layer 220 and the barrier layer 222 may, for example, bedeposited or grown by CVD, PVD, ALD, sputtering, electrochemicalplating, electroless plating, or some other deposition or growthprocess.

The first conductive wire 216 extends from a first input/output (I/O)bond structure 224 of the inductor unit 204/206 to a second I/O bondstructure 226 of the inductor unit 204/206. In some embodiments, thefirst conductive wire 216 extends continuously from the first I/O bondstructure 224 to the second I/O bond structure 226 in a substantiallystraight line. Further, the first conductive wire 216 may conformallyline the first magnetic layer 214 and extend beyond outermost sidewallsof the first magnetic layer 214, such that the first conductive wire 216has a first upper surface over the first magnetic layer 214 that isabove a second upper surface of the first conductive wire 216 beyondoutermost sidewalls of the first magnetic layer 214. In otherembodiments, the first conductive wire 216 wire continuously extendsfrom the first I/O bond structure 224 to the second I/O bond structure226 in a helical pattern around the first magnetic layer 214. In someembodiments, the second conductive wire 218 extends from a third I/Obond structure 228 of the inductor unit 204/206 to a fourth I/O bondstructure 230 of the inductor unit, and has a substantially identicallayout to the first conductive wire 216. Accordingly, because eachinductor unit 204/206 has its own respective I/O bond structures224/226/228/230, a PCB may connect the inductor units 204/206 in variouscombinations to have the multi-terminal inductor 202 output variousinductances without the need to have an application specific inductordesign, which may result in increased manufacturing costs or inefficientoperating conditions.

A second isolation layer 232 is disposed over the conductive wire216/218. In some embodiments, the second isolation layer 232 mayconformally line the surfaces of the passivation layer 212, the firstmagnetic layer 214, and the conductive wires 216/218, such that thesecond isolation layer 232 directly contacts the passivation layer 212,the first magnetic layer 214, and the conductive wires 216/218. Thesecond isolation layer 232 comprises a dielectric material, such asSiO₂, Si₃N₄, a low-k dielectric, or some other suitable dielectricmaterial. The second isolation layer 232 may, for example, be depositedor grown by CVD, PVD, ALD, sputtering, or some other deposition orgrowth process.

A first dielectric layer 234 is disposed over the second isolation layer232. The first dielectric layer 234 may, for example, be a polyimidecompound, a polybenzoxazole compound, and/or any other suitabledielectric material. The first dielectric layer 234 may, for example, bedeposited or grown by CVD, PVD, ALD, sputtering, a spin-on process, orsome other deposition or growth process. In some embodiments, the firstdielectric layer 234 may have a substantially planar upper surface. Inyet further embodiments, over the first magnetic layer 214, the firstdielectric layer 234 may have a thickness in a range from about 0.5 μmto about 70 μm. More specifically, the thickness may be in a range from0.5 μm to 5 μm, 5 μm to 10 μm, 10 μm to 15 μm, 15 μm to 20 μm, 20 μm to25 μm, 25 μm to 30 μm, 30 μm to 40 μm, 40 μm to 50 μm, 50 μm to 60, or60 μm to 70. Further, over the first magnetic layer 214, the dielectricmay have a width in a range from about 10 μm to about 450 μm. Morespecifically, the width may be in a range from 10 μm to 50 μm, 50 μm to100 μm, 100 μm to 150 μm, 150 μm to 200 μm, 200 μm to 250 jam, 250 μm to300 μm, 300 μm to 350 μm, 350 μm to 400, or 400 μm to 450 μm.

In some embodiments, a second magnetic layer 236 is disposed over thefirst dielectric layer 234. The second magnetic layer 236 is formed overthe first dielectric layer 234 using a suitable process, for example,CVD, PVD, ALD, sputtering, electrochemical plating, electroless plating,or some other deposition or growth process. The second magnetic layer236 comprises a magnetic material, such as cadmium zinc telluride (CZT),an iron-nickel (NiFe) compound, or other suitable magnetic materials. Insome embodiments, the second magnetic layer may 236 comprises aplurality of stacked layers. In other embodiments, the second magneticlayer 236 may comprises a bulk magnetic material that extends from abottom surface of the second magnetic layer 236 to a top surface of thesecond magnetic layer 236.

A second dielectric layer 238 is disposed over the second magnetic layer236. The second dielectric layer 238 lines an upper surface of thesecond magnetic layer 236 and an upper surface of the first dielectriclayer 234. In some embodiments, the second dielectric layer 238 may, forexample, be a polyimide compound, a polybenzoxazole compound, and/or anyother suitable dielectric material. The second dielectric layer 238 may,for example, be deposited or grown by CVD, PVD, ALD, sputtering, aspin-on process, or some other deposition or growth process. In furtherembodiments, the first dielectric layer may have a substantially planarupper surface.

The I/O bond structures 224/226/228/230 each branch off of theirrespective conductive wires 216/218. In some embodiments, each I/O bondstructure 224/226/228/230 branches off of their respective conductivewire 216/218 through the second isolation layer 232, the firstdielectric layer 234, and the second dielectric layer 238 to protrudefrom an uppermost surface of the second dielectric layer 238. In someembodiments, each I/O bond structure 224/226/228/230 branches off oftheir respective conductive wire 216/218 towards the semiconductorsubstrate 208 to connect to a conductive feature of the interconnectstructure 210. Further, each I/O bond structure 224/226/228/230 maybranch off of their respective conductive wire 216/218 at a non-zeroangle to provide adequate spacing between the I/O bond structures224/226/228/230, such that the I/O bond structures 224/226/228/230 areoffset from their respective conductive wires 216/218 by a distance. Insome embodiments, the I/O bond structures 224/226/228/230 comprise Cu,Cu alloys, Al, Al alloys, Au, Ag, Al—Cu compounds, or other suitablematerials. The I/O bond structures 224/226/228/230 may, for example, beformed by CVD, PVD, ALD, sputtering, electrochemical plating,electroless plating, or some other deposition or growth process.Accordingly, a customer (or a manufacturer) may use an externalconnection (e.g., a PCB) to connect the I/O bond structures224/226/228/230 in various combinations to have the multi-terminalinductor 202 output various inductances. Because the multi-terminalinductor unit 202 comprises a plurality of inductor units 204/206, themulti-terminal inductor unit 202 provides customers (or manufacturers)with more inductance options without requiring an application specificinductor design, which may result in increased manufacturing costs orinefficient operating conditions.

With reference to FIGS. 3A-3C, various views 300A-300C of some moreembodiments of the multi-terminal inductor 202 of FIGS. 2A-2C areprovided. FIG. 3A illustrates a simplified top view 300A of someembodiments of an inductor unit 204 of the multi-terminal inductor 202of FIGS. 2A-2C. FIG. 3B illustrates a simplified top view 300B of someembodiments of the multi-terminal inductor 202 of FIGS. 2A-2C connectedin a dual-current configuration. FIG. 3C illustrates a simplified topview 300C of some embodiments of a multi-terminal inductor 202 of FIGS.2A-2C connected in a single-current configuration. FIGS. 3A-3C are“simplified” because FIGS. 3A-3C illustrate only the conductive wires,first magnetic layer, and second magnetic layer of each inductor unit.

As illustrated by the views 300A-300C of FIGS. 3A-3C, as current I₁/I₂passes through a conductive wire 216/218, each conductive wire 216/218induces a magnetic field. Depending on the direction of current I₁/I₂flow, a magnetic field will be induced based on the “right-hand rule.”For example, in some embodiments, a circuit is configured to provide afirst current I₁ through the first conductive wire 216 so the firstcurrent I₁ flows from the left side of the page to the right side of thepage, and provides a second current I₂ through the second conductivewire 218 so a second current I₂ flows from the right side of the page tothe left side of the page. Thus, a first magnetic field is inducedaround the first conductive wire 216, and a second magnetic field isinduced around the second conductive wire 218. Thus, the inductor units204/206 have a measurable inductance.

As illustrated by the view 300B of FIG. 3B, a first inductor unit 204 isconnected in series with a second inductor unit 206 and are connected ina dual-current configuration. The first inductor unit 204 and secondinductor unit 206 are connected in a dual-current configuration becauseconductive traces 118 of a PCB (not shown) allow current to flow inopposite directions in each inductor unit 204/206. For example, a firstcurrent I₁ flows from the first I/O bond structure 224 of the firstinductor unit 204 through the first conductive wire 216 of the firstinductor unit 204 to the second I/O bond structure 226 of the firstinductor unit 204. A conductive trace 118 couples the second I/O bondstructure 226 of the first inductor unit 204 to a first I/O bondstructure 308 of the second inductor unit 206 to allow the first currentI₁ to flow into a first conductive wire 316 of the second inductor unit206 and out of the second I/O bond structure 310 of the second inductorunit 206.

A second current I₂ flows from the fourth I/O bond structure 314 of thesecond inductor unit 206 through a second conductive wire 320 of thesecond inductor unit 206 to the third I/O bond structure 312 of thesecond inductor unit 206. A conductive trace 118 couples the third I/Obond structure 312 of the second inductor 204 to a fourth I/O bondstructure 230 of the first inductor unit 204 to allow the second currentI₂ to flow into the second conductive wire 218 of the first inductorunit 204 and out of the third I/O bond structure 228 of the firstinductor unit 204. In some embodiments, the second inductor unit 206 maycomprise a fifth I/O bond structure 318 that may be connected via aconductive trace 118 rather than connecting the conductive trace 118 tothe third I/O bond structure 312. The fifth I/O bond structure 318 isdisposed between the third I/O bond structure 312 and the fourth I/Obond structure 314. Thus, if current flows from the fourth I/O bondstructure 314 to the fifth I/O bond structure 318, the second inductorunit 206 will have a measurable inductance that is less than ameasurable inductance if current flows from the fourth I/O bondstructure 314 to the third I/O bond structure 312. Accordingly, becausethe multi-terminal inductor 202 has a plurality of inductor units204/206, the multi-terminal inductor unit 202 provides customers (ormanufacturers) with more inductance options without requiring anapplication specific inductor design, which may result in increasedmanufacturing costs or inefficient operating conditions.

Moreover, as illustrated by the view 300C of FIG. 3C, the first inductorunit 204 and second inductor unit 206 are connected in a single-currentconfiguration. The first inductor unit 204 and second inductor unit 206are connected in a single-current configuration because conductivetraces 118 of a PCB (not shown) allow current to only flow through onedirection of each inductor unit 204/206. Moreover, in FIG. 3C, the firstmagnetic layer 214 continuously extends beneath both the first inductorunit 204 and the second inductor unit 206. Accordingly, because themulti-terminal inductor 202 can also be connected in a single-currentconfiguration or a dual-current configuration, the multi-terminalinductor unit 202 provides additional inductance options to customers(or manufacturers), without requiring an application specific inductordesign, which may result in increased manufacturing costs or inefficientoperating conditions.

With reference to FIGS. 4A-4C, various views 400A-400C of some moreembodiments of the multi-terminal inductor 202 of FIGS. 2A-2C areprovided. FIG. 4A illustrates a simplified top view 400A of someembodiments of the first inductor unit 204 of the multi-terminalinductor 202 of FIGS. 2A-2C. FIG. 4B illustrates a simplified top view400B of some embodiments of the multi-terminal inductor 202 of FIGS.2A-2C with each inductor unit 204/206 disposed over discrete portions ofthe first magnetic layer 214. FIG. 4C illustrates a simplified top view400C of some embodiments of a multi-terminal inductor 202 of FIGS. 2A-2Cwhere the first magnetic layer 214 continuously extends between a firstinductor unit 204 and a second inductor unit 206. FIGS. 4A-4C are“simplified” because FIGS. 4A-4C illustrate only the conductive wires216/218, first magnetic layer 214, and second magnetic layer 236 of eachinductor unit 204/206.

As illustrated by the views 400A-400C of FIGS. 4A-4C, the inductor unit204/206 comprises only a single conductive wire 216/316 continuouslyextending from a first I/O bond structure 224/308 to a second I/O bondstructure 226/310. In some embodiments, each inductor unit 204/206 maybe disposed over a discrete portion of the first magnetic layer 214, asillustrated in FIG. 4B. In other embodiments, the first magnetic layer214 continuously extends under both the first inductor unit 204 and thesecond inductor unit 206, as illustrated in view 400C of FIG. 4C.

With reference to FIGS. 5A-5C through 6A-6C, various views of variousmore embodiments of the multi-terminal inductor 202 of FIGS. 2A-2Cwithout a first magnetic layer 214 or a second magnetic layer 236 areprovided. Figures with the suffix “A” (e.g., FIG. 5A) arecross-sectional views, taken along line A-A′ of FIG. 2A, of someembodiments of the first inductor unit 204 without the first magneticlayer 214 or the second magnetic layer 236. Figures with the suffix “B”(e.g., FIG. 5B) are top views of the first inductor unit 204 of themulti-terminal inductor 202 without the first magnetic layer 214 or thesecond magnetic layer 236. Figures with the suffix “C” (e.g., FIG. 5C)are top views of some embodiments of the multi-terminal inductor 202 ofFIGS. 2A-2C without a first magnetic layer 214 or a second magneticlayer 236.

As illustrated in views 500A-500C of FIGS. 5A-5C, the first inductorunit 204 does not comprise a first magnetic layer 214 or a secondmagnetic layer 236. Instead, the first conductive wire 216 and thesecond conductive wire 218 are separated from the passivation layer 212by only a barrier layer 222. Although the inductor unit 204 does notcomprises a first magnetic layer 214 or a second magnetic layer 236,each inductor unit 204/206 has a measurable inductance when currentflows through their respective conductive wires 216/218/316/320. Becauseeach inductor unit 204/206 comprises a first conductive wire 216/316 anda second conductive wire 218/320, the first inductor unit 204 and secondinductor unit 206 can be connected via conductive traces 118 of a PCB(not shown) in either dual-current configuration or single-currentconfiguration. In other embodiments, as illustrated in views 600A-600Cof FIGS. 6A-6C, the inductor unit 204/206 may comprise only a singleconductive wire 216/316 continuously extending from a first I/O bondstructure 224/308 to a second I/O bond structure 226/310.

With reference to FIGS. 7A-7E, various views 700A-700E of some moreembodiments of the multi-terminal inductor 202 of the present disclosureare provided. FIG. 7A illustrates a simplified top view 700A of someembodiments of the multi-terminal inductor 202 of the presentdisclosure. FIG. 7B illustrates a perspective view 700B of someembodiments of the first inductor unit 204 of the multi-terminalinductor 202 of FIG. 7A projecting from line A-A′ of FIG. 7A to a sideof the first inductor unit 204. FIG. 7C illustrates a more detailedcross-sectional view 700C of some embodiments of the first inductor unit204 of the multi-terminal inductor 202 of FIG. 2A, taken along line C-C′of FIG. 7A. FIG. 7D illustrates a cross-sectional view 700D of someembodiments of the first inductor unit 204 of the multi-terminalinductor 202 of FIG. 7A, taken along line A-A′ of FIG. 7B. FIG. 7Eillustrates a simplified top view 700E of some embodiments of the firstinductor unit 204 of the multi-terminal inductor 202 of FIGS. 7A-7D.FIGS. 7A and 7E are “simplified” because several layers and featuresdepicted in FIGS. 7B-7D are not illustrated, for example, the seconddielectric layer 238 is not depicted.

As illustrated by the views 700A-700E of FIGS. 7A-7E, the first inductorunit 204 comprises a second conductive wire 702 disposed over the firstconductive wire 216. In some embodiments, vias 704 connect the secondconductive wire 702 to the first conductive wire 216, such that thefirst conductive wire 216 and the second conductive wire 702continuously extend from the first I/O bond structure 224 to the secondI/O bond structure 226 in a helical pattern around the first magneticlayer 214. The second conductive wire 702 and the vias 704 may, forexample, be deposited or grown by CVD, PVD, ALD, sputtering,electrochemical plating, electroless plating, or some other depositionor growth process. The vias 704 may, for example, be formed by a singledamascene like process or a dual damascene process.

The second conductive wire 702 and the vias 704 comprise a conductivematerial, such as copper (Cu), aluminum (Al), gold (Au), silver (Ag),Al—Cu compounds, or any other suitable conductive material. In someembodiments, the second conductive wire 702 may be a post-passivationcopper interconnect. In some embodiments, the second conductive wire 702has a thickness in a range from about 0.5 μm to about 50 μm and/or awidth in a range from about 0.5 μm to about 50 μm. More specifically,the second conductive wire 702 may have a thickness/width in a rangefrom 0.5 μm to 5 μm, 5 μm to 10 μm, 10 μm to 15 μm, 15 μm to 20 jam, 20μm to 25 μm, 25 μm to 30 μm, 30 μm to 40 μm, or 40 μm to 50 μm.

A third isolation layer 706 separates the first magnetic layer 214 fromthe first dielectric layer 234. In some embodiments, the vias 704 extendthrough the third isolation layer 706 to connect the second conductivewire 702 to the first conductive wire 216. The third isolation layer 706comprises a dielectric material, such as SiO₂, Si₃N₄, a low-kdielectric, or some other suitable dielectric material. The thirdisolation layer 706 may, for example, be deposited or grown by CVD, PVD,ALD, sputtering, or some other deposition or growth process.

A third dielectric layer 708 is disposed over the second dielectriclayer 238. In some embodiments, the third dielectric layer 708 extendsbetween sidewalls of the second conductive wire 702 and contacts anupper surface of the second dielectric layer 238. Further, the thirddielectric layer 708 may have a substantially planar upper surface. Insome embodiments, the third dielectric layer 708 may, for example, be apolyimide compound, a polybenzoxazole compound, and/or any othersuitable dielectric material. The third dielectric layer 708 may, forexample, be deposited or grown by CVD, PVD, ALD, sputtering, a spin-onprocess, or some other deposition or growth process.

With reference to FIG. 8, a simplified top view 800 of some embodimentsof the first inductor unit 204 of the multi-terminal inductor 202 ofFIGS. 7A-7E is provided. FIG. 8 is “simplified” because FIG. 8illustrates only the second conductive wire 702 continuously extendingin a helical pattern around the first magnetic layer 214.

As illustrated in view 800 of FIG. 8, in some embodiments, the firstinductor unit 204 may comprise a third I/O bond structure 802 and afourth I/O bond structure 804 disposed between the first I/O bondstructure 224 and the second I/O bond structure 226. Thus, the I/O bondstructures 224/226/802/804 can be connected in various combinations,such that the first inductor unit 204 can be configured to have variousinductances. Accordingly, because the multi-terminal inductor 202 has aplurality of inductor units 204/206, the multi-terminal inductor unit202 provides customers (or manufacturers) with more inductance optionswithout requiring an application specific inductor design, which wouldresult in increased manufacturing costs or inefficient operatingconditions.

With reference to FIG. 9, a simplified top view 900 of some embodimentsof the first inductor unit 204 of the multi-terminal inductor 202 ofFIGS. 7A-7E is provided. FIG. 9 is “simplified” because FIG. 9illustrates only the first conductive wire 216 and the second conductivewire 702 continuously extending in a helical pattern around the firstmagnetic layer 214, and a third conductive wire 902 continuouslyextending around the first magnetic layer 214 in a helical pattern.

As illustrated in view 900 of FIG. 9, in some embodiments, the firstinductor unit 204 may comprise a third conductive wire 902. The thirdconductive wire 902 extends from a first I/O bond structure 904 of thethird conductive wire 902 to a second I/O bond structure 906 of thethird conductive wire 902. In some embodiments, a third I/O bondstructure 908 of the third conductive wire 902 is disposed between thefirst I/O bond structure 904 of the third conductive wire 902 and thesecond I/O bond structure 906 of the third conductive wire 902. In someembodiments, vias (not shown) connect the third conductive wire 902 to afourth conductive wire (not shown), such that the third conductive wire902 and fourth conductive wire (not shown) continuously extend from thefirst I/O bond structure 904 of the third conductive wire 902 to thesecond I/O bond structure 906 of the third conductive wire 902 in ahelical pattern. The helical pattern of the first conductive wire 216and second conductive wire 702 crosses the helical pattern of the thirdconductive wire 902 and the fourth conductive wire (not shown), but eachhelical pattern is configured to transmit a discrete signal along theirrespective conductive wires 216/702/902.

With reference to FIGS. 10A-10C, various views 1000A-1000C of moreembodiments of the multi-terminal inductor 202 of FIGS. 7A-7E without afirst magnetic layer 214 are provided. FIG. 10A is a cross-sectionalview 1000A, taken along line A-A′ of FIG. 7A, of some embodiments of thefirst inductor unit 204 without the first magnetic layer 214. FIG. 10Bis a simplified top view 1000B of some embodiments of the first inductorunit 204 of the multi-terminal inductor 202 of FIGS. 7A-7E without afirst magnetic layer 214. FIG. 10C is a simplified top view 1000C ofsome other embodiments of the first inductor unit 204 of themulti-terminal inductor 202 of FIGS. 7A-7E without a first magneticlayer 214. FIGS. 10B-10C are “simplified” because FIGS. 10B-10Cillustrate only the first conductive wire 216 and the second conductivewire 702 continuously extending in a helical pattern.

As illustrated in views 1000A-1000C of FIGS. 10A-10C, the first inductorunit 204 does not comprise a first magnetic layer 214. Instead, thefirst conductive wire 216 and the second conductive wire 702 areconnected by vias (not shown), such that the first conductive wire 216and the second conductive wire 702 continuously extend in a helicalpattern. In some embodiments, the first conductive wire 216 and thesecond conductive wire 702 continuously extend in a helical patternaround a dielectric material (not shown). In some embodiments, thedielectric layer may comprise multiple layers, or be a single bulkdielectric material, such as a polyimide compound, a polybenzoxazolecompound, and/or any other suitable dielectric material.

With reference to FIGS. 11-17, a series of views 1100-1700 of someembodiments of a method for forming an inductor unit 204/206 of themulti-terminal inductor unit 202 of the present disclosure is provided.

As illustrated by the view 1100 of FIG. 11, a semiconductor substrate208 is provided. The semiconductor substrate 208 may comprise any typeof semiconductor body (e.g., monocrystalline silicon/CMOS bulk, SiGe,silicon on insulator (SOI), etc.). In some embodiments, semiconductordevices are formed within/over the semiconductor substrate 208. Forexample, the semiconductor device may be a transistor comprising a gatestack (e.g., a metal gate disposed over a high-k dielectric) disposedover the semiconductor substrate 208 and between a source and drain,while the source and drain are disposed within the semiconductorsubstrate 208.

In some embodiments, a process for forming the semiconductor devicescomprises forming a patterned photoresist layer (not shown) on thesemiconductor substrate 208. The patterned photoresist layer may, forexample, be formed by a spin-on process. The patterned photoresist layermay, for example, be patterned with a layout having a plurality ofsources/drains and may, for example, be patterned usingphotolithography. In some embodiments, the process for forming thesource/drain of the semiconductor devices comprises performing ionimplantation with the patterned photoresist in place, and subsequentlystripping the patterned photoresist. Further, in some embodiments, thegate may be, for example, formed by CVD, PVD, ALD, sputtering, a spin-onprocess, or some other deposition or growth process with the patternedphotoresist (not shown) in place, and subsequently stripping thepatterned photoresist.

As illustrated by the view 1200 of FIG. 12, an interconnect structure210 is formed over and in direct contact with the semiconductorsubstrate 208. The interconnect structure 210 comprises a plurality ofconductive features, such as metal interconnect wires, vias, and/orcontact pads interconnecting semiconductor devices. In some embodiments,the plurality of conductive features are formed in a plurality of metallayers formed over one another. In some embodiments, the conductivefeatures may be formed by a combination of photolithography andapplicable deposition or growth processes, such as electrochemicalplating, electroless plating, chemical or physical vapor deposition,sputtering, or some other deposition or growth process. The process may,for example, be part of a single damascene like process or a dualdamascene like process. In some embodiments, a chemical mechanicalpolishing (CMP) process may be performed after forming each metal layerto form substantially planar upper surfaces.

As illustrated by the view 1300 of FIG. 13, a passivation layer 212 isformed over and in direct contact with the interconnect structure 210.The passivation layer 212 may comprise a dielectric material, such asSiO₂, silicon nitride (Si₃N₄), polyimide compounds, or other suitablematerials. The passivation layer 212 may, for example, be formed by acombination of photolithography and an applicable deposition or growthprocess, such as CVD, PVD, sputtering, a spin-on process, or some otherdeposition or growth process. In some embodiments, a CMP process may beperformed after the passivation layer 212 is deposited to create asubstantially planar upper surface.

As illustrated by the view 1400 of FIG. 14, a barrier layer 222 isformed over and in direct contact with the passivation layer 212. Insome embodiments, the barrier layer 222 comprises tantalum (Ta),tantalum nitride (TaN), titanium (Ti), titanium nitride (TiN), and/ortungsten (W) among others. The barrier layer 222 may, for example, bedeposited or grown by CVD, PVD, ALD, sputtering, electrochemicalplating, electroless plating, or some other deposition or growthprocess. In some embodiments, the barrier layer 222 conformally linesthe passivation layer 212. Although not depicted in view 1600 of FIG.14, it will be appreciated that a seed layer, from which the conductivewire 216/218 is grown, may be formed over the barrier layer 222. Theseed layer comprises Cu, Cu alloys, Al, Al alloys, Au, Ag, Al—Cucompounds, or other suitable materials, and may coalesce into theconductive wire 216/218 when the conductive wire 216/218 is grown fromthe seed layer. The seed layer may, for example, be deposited or grownby CVD, PVD, ALD, sputtering, electrochemical plating, electrolessplating, or some other deposition or growth process.

As illustrated by the view 1500 of FIG. 15, a first conductive wire 216and a second conductive wire 218 are formed, with a patternedphotoresist layer 1502 in place, over and in direct contact with thebarrier layer 222. The patterned photoresist layer 1502 is formed overthe barrier layer 222 by, for example, a spin-on process in combinationwith a subsequent photolithography process to define openings in thepatterned photoresist layer 1502. The first conductive wire 216 and thesecond conductive wire 218 may, for example, be deposited or grown byCVD, PVD, ALD, sputtering, electrochemical plating, electroless plating,or some other deposition or growth process. In further embodiments, thefirst conductive wire 216 and the second conductive wire 218 maycomprise, for example, Cu, Al, Au, Ag, Al—Cu compounds, or any othersuitable conductive material.

The patterned photoresist layer 1502 is subsequently stripped from thebarrier layer 222 by, for example, a wet etch or dry etch process. Insome embodiments, the stripping of the patterned photoresist layer 1502also removes portions of the barrier layer 222 that are not covered bythe conductive wires 216/218. In other embodiments, a subsequent etchingand photolithography process may be performed to remove portions of thebarrier layer 222 that are not covered by the conductive wires 216/218.

As illustrated by the view 1600 of FIG. 16, a second isolation layer 232is formed over the first conductive wire 216 and the second conductivewire 218. In some embodiments, the second isolation layer conformallylines and is in direct contact with the passivation layer 212, the firstconductive wire 216, and the second conductive wire 218. The secondisolation layer 232 comprises a dielectric material, such as SiO₂,Si₃N₄, a low-k dielectric, or some other suitable dielectric material.The second isolation layer 232 may, for example, be deposited or grownby CVD, PVD, ALD, sputtering, or some other deposition or growthprocess.

As illustrated by the view 1700 of FIG. 17, a first dielectric layer 234is formed over and in direct contact with the second isolation layer232. The first dielectric layer 234 may, for example, be a polyimidecompound, a polybenzoxazole compound, or any other suitable dielectricmaterial. The first dielectric layer 234 may, for example, be depositedor grown by CVD, PVD, ALD, sputtering, a spin-on process, or some otherdeposition or growth process. In some embodiments, a CMP process may beperformed after the first dielectric layer 234 is deposited to create asubstantially planar upper surface.

Although not shown in the cross-sectional views 1100-1700 taken alongA-A′, it will be appreciated that I/O bond structures 224/226/228/230extending through the first dielectric layer 234 and the seconddielectric layer 238 are formed to provide connections to the conductivewires 216/218. For example, the I/O bond structures 224/226/228/230 maycomprise a bond pad disposed over the second dielectric layer 238. TheI/O bond structures extend from the bond pad through the seconddielectric layer 238 and the first dielectric layer 234 to theirrespective conductive wires 216/218. In some embodiments, the I/O bondstructures 224/226/228/230 comprise Cu, Cu alloys, Al, Al alloys, Au,Ag, Al—Cu compounds, or other suitable materials. The I/O bondstructures 224/226/228/230 may, for example, be formed by CVD, PVD, ALD,sputtering, electrochemical plating, electroless plating, or some otherdeposition or growth process.

Further, although FIGS. 11-17 illustrate a process for forming theembodiment depicted in FIG. 5A-5C, it will be appreciated that a personof ordinary skill could implement the steps above (or substantiallysimilar steps) to form the embodiments depicted in FIGS. 2A-2C, 3A-3C,FIGS. 4A-4C, FIGS. 6A-6C, FIGS. 7A-7E, FIG. 8, FIG. 9, and FIGS.10A-10C.

With reference to FIG. 18, a flowchart 1800 of some embodiments of themethod for forming the multi-terminal inductor of the present disclosureand selectively setting the inductance of the multi-terminal inductor isprovided. While the disclosed method and other methods illustratedand/or described herein may be illustrated and/or described herein as aseries of acts or events, it will be appreciated that the illustratedordering of such acts or events are not to be interpreted in a limitingsense. For example, some acts may occur in different orders and/orconcurrently with other acts or events apart from those illustratedand/or described herein. Further, not all illustrated acts may berequired to implement one or more aspects or embodiments of thedescription herein, and one or more of the acts depicted herein may becarried out in one or more separate acts and/or phases.

At 1802, an interconnect structure is formed over a semiconductorsubstrate, where the interconnect structure has a plurality of metallayers. An example of act 1802 can be seen with regards to previouslyillustrated FIG. 12.

At 1804, a passivation layer is formed over the interconnect structure.An example of act 1804 can be seen with regards to previouslyillustrated FIG. 13.

At 1806, a barrier layer is formed over the passivation layer. Anexample of act 1806 can be seen with regards to previously illustratedFIG. 14.

At 1808, a first conductive wire and a second conductive wire are formedover the barrier layer. An example of act 1808 can be seen with regardsto previously illustrated FIG. 15.

At 1810, an isolation layer is formed over the first conductive wire andthe second conductive wire. An example of act 1810 can be seen withregards to previously illustrated FIG. 16.

At 1812, a dielectric layer is formed over the isolation layer. Anexample of act 1812 can be seen with regards to previously illustratedFIG. 17.

At 1814, a first input/output (I/O) bond structure and a second I/O bondstructure are formed at a first location and a second location,respectively. The first location and the second location are spacedapart. The first I/O bond structure extends through the dielectric layerto contact the first conductive wire at the first location. The secondI/O bond structure extends through the dielectric layer to contact thefirst conductive wire at the second location. In some embodiments, thefirst I/O bond structure and the second I/O bond structure comprise Cu,Cu alloys, Al, Al alloys, Au, Ag, Al—Cu compounds, or other suitablematerials. The first I/O bond structure and the second I/O bondstructure may, for example, be formed by CVD, PVD, ALD, sputtering,electrochemical plating, electroless plating, or some other depositionor growth process. An example of a first I/O bond structure and a secondI/O bond structure contacting a first conductive wire can be seen withregards to previously illustrated FIGS. 4A-4C.

At 1816, a third I/O bond structure and a fourth I/O bond structure areformed at a third location and a fourth location, respectively. Thethird location and the fourth location are spaced apart. The third I/Obond structure extends through the dielectric layer to contact thesecond conductive wire at the third location. The fourth I/O bondstructure extends through the dielectric layer to contact the secondconductive wire at the fourth location. In some embodiments, the thirdI/O bond structure and the fourth I/O bond structure comprise Cu, Cualloys, Al, Al alloys, Au, Ag, Al—Cu compounds, or other suitablematerials. The third I/O bond structure and the fourth I/O bondstructure may, for example, be formed by CVD, PVD, ALD, sputtering,electrochemical plating, electroless plating, or some other depositionor growth process. An example of a third I/O bond structure and a fourthI/O bond structure contacting a second conductive wire can be seen withregards to previously illustrated FIGS. 4A-4C.

At 1818, a printed circuit board (PCB) having conductive traces isselectively connected to the I/O bond structures. Connecting the PCB toallow current to flow through the first I/O bond structure and out ofthe second I/O bond structure to an external device, sets themulti-terminal inductor to have a first inductance. Alternatively,connecting the PCB to allow current to flow through the first I/O bondstructure, the second I/O bond structure, the third I/O bond structure,and out of the fourth I/O bond structure to the external device, setsthe multi-terminal inductor to have a second inductance different thanthe first inductance. In some embodiments, the second inductance isgreater than the first inductance. An example of alternative connectionsbetween I/O bond structures can be seen with regards to previouslyillustrated FIGS. 1A-1B.

Thus, as can be appreciated from above, the present disclosure relatesto a multi-terminal inductor that provides customers (or manufactures)with increased inductance options without requiring an applicationspecific inductor design. Accordingly, the multi-terminal inductor mayimprove the functionality of ICs and cost of manufacturing ICs.

Accordingly, in some embodiments, the present application provides amulti-terminal inductor. The multi-terminal inductor includes asemiconductor substrate. An interconnect structure having a plurality ofmetal layers is arranged over the semiconductor substrate. A firstmagnetic layer is arranged over an uppermost surface of the interconnectstructure. A conductive wire is arranged over the first magnetic layer.A first input/output (I/O) bond structure branches off of the conductivewire at a first location. A second I/O bond structure branches off ofthe conductive wire at a second location. The second location is spacedapart from the first location. A third I/O bond structure branches offof the conductive wire at a third location between the first locationand the second location, where a connection between the third I/O bondstructure and the first I/O bond structure has a first inductance and analternative connection between the first I/O bond structure and thesecond I/O bond structure has a second inductance that is greater thanthe first inductance.

In other embodiments, the present application provides a multi-terminalinductor having a semiconductor substrate. An interconnect structurehaving a plurality of metal layers is arranged over the semiconductorsubstrate. A passivation layer is arranged over an uppermost surface ofthe interconnect structure. A magnetic layer is arranged over thepassivation layer. A plurality of inductor units including a pluralityof conductive wires, respectively, are spaced apart from one another andarranged over the magnetic layer, where a first inductor unit includes adielectric layer extending over a first conductive wire of the firstinductor unit and includes a first terminal and a second terminal thatextend through the dielectric layer to provide electrical connections tothe first conductive wire of the first inductor unit. A connectionstructure is arranged over the dielectric layer and has conductivetraces electrically coupled to the first and second terminals, where theconnection structure electrically couples some, but not all, of theplurality of inductor units in series with one another.

In yet other embodiments, the present application provides a method. Themethod includes forming an interconnect structure having a plurality ofmetal layers over a semiconductor substrate. A passivation layer isformed over an uppermost surface of the interconnect structure. A firstmagnetic layer is formed over the passivation layer. A plurality ofconductive wires that are spaced apart from one another are formed overthe first magnetic layer. A dielectric layer is formed over theplurality of conductive wires. A plurality of solder bumps are formedover the dielectric layer, where different solder bumps of the pluralityof solder bumps are electrically coupled to different conductive wires.A printed circuit board (PCB) having conductive traces is selectivelyconnected to some, but not all, of the plurality of solder bumps.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions, andalterations herein without departing from the spirit and scope of thepresent disclosure.

What is claimed is:
 1. A multi-terminal inductor, comprising: aninterconnect structure disposed over a semiconductor substrate; apassivation layer disposed over the interconnect structure and thesemiconductor substrate; a plurality of inductor units disposed over thepassivation layer and the interconnect structure, wherein the inductorunits are laterally spaced from one another, and wherein each of theinductor units comprises: a conductive wire; and two or moreinput/output (I/O) bond structures that branch off the conductive wire,wherein the I/O bond structures of the two or more I/O bond structuresbranch off of the conductive wire at different locations.
 2. Themulti-terminal inductor of claim 1, wherein the inductor units aredisposed in an array comprising two or more row and two or more columns.3. The multi-terminal inductor of claim 1, wherein: the inductor unitshave inductance values, respectively; and the inductance values aresubstantially the same.
 4. The multi-terminal inductor of claim 1,wherein: a first inductor unit of the inductor units has a firstinductance value; and a second inductor unit of the inductor units has asecond inductance value that is different than the first inductancevalue.
 5. The multi-terminal inductor of claim 1, wherein: a firstinductor unit of the inductor units has a first inductance value; asecond inductor unit of the inductor units has a second inductance valuethat is substantially the same as the first inductance value; and athird inductor unit of the inductor units has a third inductance valuethat is different than both the first inductance value and the secondinductance value.
 6. The multi-terminal inductor of claim 1, whereineach of the inductor units further comprises: a magnetic layer disposedbetween the conductive wire and the passivation layer.
 7. Themulti-terminal inductor of claim 1, further comprising: a dielectriclayer disposed over the passivation layer and the conductive wire ofeach of the inductor units, wherein the dielectric layer overlies theconductive wire of each of the inductor units, and wherein the I/O bondstructures of the two or more I/O bond structures extend through anuppermost surface of the dielectric layer.
 8. The multi-terminalinductor of claim 7, further comprising: a connection structure disposedover the dielectric layer, wherein the connection structure comprises aplurality of conductive traces that electrically couple some, but notall, of the inductor units together.
 9. A multi-terminal inductor,comprising: an interconnect structure disposed over a semiconductorsubstrate, where the interconnect structure comprises a plurality ofconductive features; a passivation layer disposed over the interconnectstructure; a first conductive wire disposed over the passivation layer;a second conductive wire disposed over the passivation layer andlaterally spaced from the first conductive wire; a dielectric layerdisposed over the passivation layer, the first conductive wire, and thesecond conductive wire; a first pair of terminals extending verticallyfrom the first conductive wire through an uppermost surface of thedielectric layer, wherein the terminals of the first pair of terminalsbranch off of the first conductive wire at different locations; and asecond pair of terminals extending vertically from the second conductivewire through the uppermost surface of the dielectric layer, wherein theterminals of the second pair of terminals branch off of the secondconductive wire at different locations.
 10. The multi-terminal inductorof claim 9, further comprising: a barrier layer disposed verticallybetween the passivation layer and the first conductive wire andvertically between the passivation layer and the second conductive wire.11. The multi-terminal inductor of claim 10, wherein the barrier layercontacts the first conductive wire, the second conductive wire, and thepassivation layer.
 12. The multi-terminal inductor of claim 11, furthercomprising: an isolation layer disposed over the passivation layer, thebarrier layer, the first conductive wire, and the second conductivewire, wherein the isolation layer lines sidewalls of the firstconductive wire, an upper surface of the first conductive wire,sidewalls of the second conductive wire, and an upper surface of thesecond conductive wire, and wherein the terminals of the first pair ofterminals and the terminals of the second pair of terminals extendvertically through the isolation layer.
 13. The multi-terminal inductorof claim 9, further comprising: a third terminal extending verticallyfrom the first conductive wire through the uppermost surface of thedielectric layer, wherein the third terminal branches off of the firstconductive wire at a different location than both of the terminals ofthe first pair of terminals; and a fourth terminal extending verticallyfrom the second conductive wire through the uppermost surface of thedielectric layer, wherein the fourth terminal branches off of the secondconductive wire at a different location than both of the terminals ofthe second pair of terminals.
 14. The multi-terminal inductor of claim9, further comprising: a first magnetic layer disposed between thepassivation layer and the first conductive wire, wherein the firstconductive wire overlies the first magnetic layer; and a second magneticlayer disposed between the passivation layer and the second conductivewire, wherein the second magnetic layer is laterally spaced from thefirst magnetic layer, and wherein the second conductive wire overliesthe second magnetic layer.
 15. The multi-terminal inductor of claim 14,further comprising: a third magnetic layer disposed over the firstconductive wire, wherein the third magnetic layer overlies the firstconductive wire and the first magnetic layer; and a fourth magneticlayer disposed over the second conductive wire and laterally spaced fromthe third magnetic layer, wherein the fourth magnetic layer overlies thesecond conductive wire and the second magnetic layer.
 16. Themulti-terminal inductor of claim 9, further comprising: a thirdconductive wire disposed over the interconnect structure and the firstconductive wire; a plurality of first conductive vias disposed betweenthe first conductive wire and the third conductive wire, wherein thefirst conductive vias connect the first conductive wire to the thirdconductive wire, such that the first conductive wire, the thirdconductive wire, and the first conductive vias make up a firstconductive helical pattern that extends between the terminals of thefirst pair of terminals; a fourth conductive wire disposed over theinterconnect structure and the second conductive wire; and a pluralityof second conductive vias disposed between the second conductive wireand the fourth conductive wire, wherein the second conductive viasconnect the second conductive wire to the fourth conductive wire, suchthat the second conductive wire, the fourth conductive wire, and thesecond conductive vias make up a second conductive helical pattern thatextends between the terminals of the second pair of terminals.
 17. Themulti-terminal inductor of claim 16, further comprising: a firstmagnetic layer disposed over the interconnect structure, the firstconductive wire, and the second conductive wire, wherein: the firstmagnetic layer overlies the first conductive wire; the third conductivewire overlies the first magnetic layer; and the first conductive helicalpattern extends around at least a portion of the first magnetic layer; asecond magnetic layer disposed over the interconnect structure, thefirst conductive wire, and the second conductive wire, wherein: thesecond magnetic layer is laterally spaced from the first magnetic layer;the second magnetic layer overlies the second conductive wire; thefourth conductive wire overlies the second magnetic layer; and thesecond conductive helical pattern extends around at least a portion ofthe second magnetic layer.
 18. A multi-terminal inductor, comprising: aninterconnect structure disposed over a semiconductor substrate; aconductive wire disposed over the interconnect structure; a firstterminal that branches off of the conductive wire at a first location; asecond terminal that branches off of the conductive wire at a secondlocation different than the first location, wherein the second locationis spaced from the first location; and a third terminal that branchesoff of the conductive wire at a third location that is different thanboth the first location and the second location, wherein a connectionbetween the third terminal and the first terminal has a first inductanceand an alternative connection between the first terminal and the secondterminal has a second inductance that is different than the firstinductance.
 19. The multi-terminal inductor of claim 18, furthercomprising: a passivation layer disposed between the interconnectstructure and the conductive wire; and a dielectric layer disposed overthe passivation layer, the conductive wire, and the interconnectstructure, wherein the first terminal, the second terminal, and thethird terminal extend vertically through an uppermost surface of thedielectric layer.
 20. The multi-terminal inductor of claim 18, wherein:the first terminal is a first input/output (I/O) structure; the secondterminal is a second I/O structure; and the third terminal is a third IOstructure.